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Unclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly
Zheng Y., Jiang C., Ng SH., Lu Y., Han F., Bach U., Gooding JJ.
DOI
10.1002/adma.201505022
Type
Journal article
Journal
Advanced Materials
Publisher
Wiley
Publication Date
03/2016
Volume
28
Pages
2330 - 2336