Unclonable Plasmonic Security Labels Achieved by Shadow-Mask-Lithography-Assisted Self-Assembly

Zheng Y., Jiang C., Ng SH., Lu Y., Han F., Bach U., Gooding JJ.

DOI

10.1002/adma.201505022

Type

Journal article

Journal

Advanced Materials

Publisher

Wiley

Publication Date

03/2016

Volume

28

Pages

2330 - 2336

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